Patent Assignment
Reel/Frame 016713/0211
Assignment of Assignor's Interest
Recorded: 2005-06-22
Pages: 5
Assignor
HITACHI, LTD.
Executed: 2003-09-12
Assignee
RENESAS TECHNOLOGY CORPORATION.
4-1, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property
(1)
Method of Fabricating a Semiconductor Integrated Circuit That Includes Patterning a Semiconductor Substrate with a First Photomask That Uses Metal for Blocking Light and Patterning the Same Substrate with a Second Photomask That Uses Organic Resin for Blocking Ligh
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Dec 28, 2004
From: TERASAWA, TSUNEO; TANAKA, TOSHIHIKO; MIYAZAKI, KO; HASEGAWA, NORIO
To: HITACHI, LTD.
Reel/Frame 016713/0218 →
Merger
Sep 10, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024982/0148 →
Change of Address
Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →