IP Library Assignment 017068/0986
Patent Assignment
Reel/Frame 017068/0986

Assignment of Assignor's Interest

Recorded: 2005-10-06 Pages: 3
Assignor
ITOH, MASAMITSU
Executed: 2005-07-22
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO 105-8001, JAPAN
Covered Property (1)
Exposure Mask Manufacturing Method, Drawing Apparatus, Semiconductor Device Manufacturing Method, and Mask Blanks Product
Patent: 7,703,066 →
Application: 11/185,945 →
Publication: US 2006/0024591
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Apr 4, 2018
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 045433/0337 →
Merger Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
Change of Name and Address Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
Change of Name and Address Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →