Assignment of Assignor's Interest

Recorded: 2005-10-13 Pages: 3

Assignors

HIRATA, HIROYASU

Executed: 2005-10-04

FUKASAWA, YUJL

Executed: 2005-10-05

EZAKI, MASANOBU

Executed: 2005-10-05

Assignee

TOSHIBA CERAMICS CO., LTD.

6-3, OHSAKI 1-CHOME, SHINAGAWA-KU, TOKYO, 141-0032, JAPAN

Covered Property (1)

Method for manufacturing synthetic silica glass substrate for photomask and synthetic silica glass substrate for photomask manufactured thereby

Application: 11/248,185 →

Publication: US 2006/0081008

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.