IP Library › Assignment 017105/0279

Patent Assignment

Reel/Frame 017105/0279

Change of Name

Recorded: 2005-12-09 Pages: 4

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Assignor

CLARIANT AZ (DEUTSCHLAND) AKTIENGESSELLSCHAFT

Executed: 2004-12-13

Assignee

AZ ELECTRONIC MATERIALS (GERMANY) GMBH

RHEINGAUSTRASSE 190-196, 65203 WIESBADEN, GERMANY

Covered Properties (35)

Process for the Preparation of an O-Naphthoquinonediazide Sulfonic Acid Ester and Photosensitive Mixture Containing Same

Patent: 4,873,169 →

Application: 07/087,599 →

Positive Radiation-Sensitive Mixture Containing Monomeric Acid- Cleavable Compound and Radiation- Sensitive Recording Material Produced Therefrom

Patent: 5,037,721 →

Application: 07/243,818 →

Positive-Working Photosensitive Composition Containing a Dye and Positive-Working Photosensitive Recording Material Prepared Therefrom

Patent: 4,927,732 →

Application: 07/260,307 →

Radiation-Curable Composition and Radiation-Sensitive Recording Material Prepared Therefrom for Use with High-Energy Radiation

Patent: 5,234,791 →

Application: 07/369,677 →

Process for Preparing Substituted 1,2-Naphthoquinone-(2)-Diazide-4- Sulfonic Acid Esters and Their Use in a Radiation-Sensitive Mixture

Patent: 5,082,932 →

Application: 07/431,182 →

Novel Radiation-Sensitive Compounds, Radiation-Sensitive Mixture Prepared Therewith and Copying Material

Patent: 5,114,816 →

Application: 07/431,221 →

Positive Radiation-Sensitive Mixture, and Radiation-Sensitive Recording Material Produced Therefrom for High-Energy Radiation

Patent: 5,217,843 →

Application: 07/491,817 →

Image Reversal Process Utilizing a Positive-Working Photosensitive Composition Containing a Dye

Patent: 5,066,567 →

Application: 07/500,201 →

Process for Preparing 7-Hydroxy-1,2-Naphthoquinone-2-Diazide-4- Sulfonic Acid or Salts Thereof

Patent: 5,192,640 →

Application: 07/564,643 →

Composition Containing Naphthoquinone Diazide Sulfonic Acid Mixed Esters and Radiation-Sensitive Recording Material Prepared Therewith

Patent: 5,306,595 →

Application: 07/862,603 →

Radiation-Sensitive Ester and Process for Its Preparation

Patent: 5,268,252 →

Application: 07/863,679 →

Radiation-Sensitive Composition Containing Esterification Product of (1,2-Naphthoquinone-2-Diazide)-Sulfonic Acid with 2,3,4,4-Tetrahydroxy Benzophenone and a Di- or Tri-Hydroxybenzophenone

Patent: 5,358,823 →

Application: 07/863,681 →

Substituted 1-Sulfonyloxy-2-Pyridones and Process for Preparing Them

Patent: 5,286,867 →

Application: 07/870,920 →

Negative-Working Radiation-Sensitive Mixtures, and Radiation-Sensitive Recording Material Produced with These Mixtures

Patent: 5,230,985 →

Application: 07/871,007 →

Acid-Cleavable Compounds, Positive-Working Radiation-Sensitive Mixture Containing These Compounds, and Radiation-Sensitive Recording Material Produced with This Mixture

Patent: 5,286,602 →

Application: 07/871,009 →

Positive-Working Radiation-Sensitive Mixtures, and Radiation-Sensitive Recording Materials Produced with These Mixtures

Patent: 5,229,254 →

Application: 07/871,027 →

Negative-Working Radiation-Sensitive Mixture, and Radiation-Sensitive Recording Material Produced with This Mixture

Patent: 6,063,545 →

Application: 07/871,032 →

Negative-Working Radiation-Sensitive Mixture, and Radiation-Sensitive Recording Material Produced with This Mixture

Patent: 5,227,276 →

Application: 07/871,033 →

Positive-Working Radiation Sensitive Mixture Comprising Sulfonic Acid Esters of 2,4,6-Tris-(2-Hydroxyethoxy)-[1,3,5]Triazine, and Recording Material Containing These Esters

Patent: 5,314,786 →

Application: 07/871,034 →

Radiation-Sensitive Mixture Containing Novel Polymers Embodying Units Composed of Amides of Alpha, Beta-Unsaturated Carboxylic Acids as Binders

Patent: 5,326,840 →

Application: 07/895,666 →

Radiation-Sensitive Sulfonic Acid Esters and Their Use

Patent: 5,298,364 →

Application: 07/895,679 →

Radiation-Sensitive Mixture with a Polymeric Binder Containing Units of Alpha, Beta-Unsaturated Carboxamides

Patent: 5,328,973 →

Application: 07/922,507 →

Positive-Working Radiation-Sensitive Mixture and Copying Material Produced Therefrom Comprising an Alpha, Alpha-Bis(Sulfonyl) Diazo Methane as an Acid Forming Compound

Patent: 5,338,641 →

Application: 08/026,077 →

(1,2-Naphthoquinone 2-Diazide) Sulfonic Acid Esters, Radiation-Sensitive Mixture Prepared Therewith and Radiation- Sensitive Recording Material

Patent: 5,563,018 →

Application: 08/032,276 →

Positive-Working Radiation-Sensitive Mixture and Copying Material Produced Therefrom Comprising an Alpha-Carbonyl-Alpha-Sulfonyl Diazomethane, a Water-Insoluble Binder and an Acid Cleavable Compound

Patent: 5,340,682 →

Application: 08/046,484 →

Radiation-Sensitive Sulfonic Acid Esters and Their Use

Patent: 5,442,061 →

Application: 08/139,017 →

Polymers Having N,N-Disubstituted Sulfonamide Pendent Groups and Use Thereof

Patent: 5,442,087 →

Application: 08/165,148 →

Negative-Working Radiation-Sensitive Mixture Containing Diazomethane Acid Generator and a Radiation-Sensitive Recording Material Produced Therfrom

Patent: 5,424,166 →

Application: 08/194,307 →

Positive-Acting Radiation-Sensitive Mixture and Recording Material Produced Therewith