IP Library › Assignment 010351/0823

Patent Assignment

Reel/Frame 010351/0823

Assignment of Assignor's Interest

Recorded: 1999-11-19 Pages: 5

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Assignor

HOECHST AKTIENGESELLSCHAFT

Executed: 1999-10-20

Assignee

CLARIANT GMBH

BRUENINGSTRASSE 50, FRANKFURT, D-659, GERMANY

Covered Properties (47)

Diazotype Materials Eith 2-Hydrozynaphthalene Having Sulfonamide as Coupler

Patent: 4,492,749 →

Application: 06/532,302 →

Solvents for Photoresist Removal

Patent: 4,765,844 →

Application: 06/920,665 →

Radiation-Sensitive Composition and Recording Material Based on Compounds Which Can Be Split by Acid

Patent: 4,678,737 →

Application: 06/931,986 →

Process for the Preparation of an O-Naphthoquinonediazide Sulfonic Acid Ester and Photosensitive Mixture Containing Same

Patent: 4,873,169 →

Application: 07/087,599 →

Positive Radiation-Sensitive Mixture and Radiation-Sensitive Recording Material Produced Therefrom

Patent: 4,946,759 →

Application: 07/243,792 →

Positive Radiation-Sensitive Mixture Containing Monomeric Acid- Cleavable Compound and Radiation- Sensitive Recording Material Produced Therefrom

Patent: 5,037,721 →

Application: 07/243,818 →

Positive-Working Photosensitive Composition Containing a Dye and Positive-Working Photosensitive Recording Material Prepared Therefrom

Patent: 4,927,732 →

Application: 07/260,307 →

Process for the Preparation of Low-Viscosity Cellulose Ethers

Patent: 4,894,448 →

Application: 07/271,347 →

Positive-Working Photosensitive Mixture and Recording Material of High Thermal Stability with Phenolic Novolak of M-Cresol and 2,3,6- Trialkylphenol

Patent: 4,971,887 →

Application: 07/330,173 →

Radiation-Curable Composition and Radiation-Sensitive Recording Material Prepared Therefrom for Use with High-Energy Radiation

Patent: 5,234,791 →

Application: 07/369,677 →

Process for Separating Solvents Used in the Purification of Products

Patent: 4,985,152 →

Application: 07/380,086 →

Process for Preparing Substituted 1,2-Naphthoquinone-(2)-Diazide-4- Sulfonic Acid Esters and Their Use in a Radiation-Sensitive Mixture

Patent: 5,082,932 →

Application: 07/431,182 →

Novel Radiation-Sensitive Compounds, Radiation-Sensitive Mixture Prepared Therewith and Copying Material

Patent: 5,114,816 →

Application: 07/431,221 →

Polyfunctional Alpha-Diaza-Beta-Keto Esters and Their Use in Light- Sensitive Compositions

Patent: 4,996,301 →

Application: 07/464,003 →

Radiation-Curable Mixture, and Radiation-Sensitive Recording Material Produced Therefrom for High-Energy Radiation

Patent: 5,614,351 →

Application: 07/491,813 →

Positive Radiation-Sensitive Mixture, and Radiation-Sensitive Recording Material Produced Therefrom for High-Energy Radiation

Patent: 5,217,843 →

Application: 07/491,817 →

Image Reversal Process Utilizing a Positive-Working Photosensitive Composition Containing a Dye

Patent: 5,066,567 →

Application: 07/500,201 →

Apparatus for Determining the Ph of Liquids

Patent: 5,236,568 →

Application: 07/754,672 →

Radiation-Sensitive Polymers Containing Diazocarbonyl Groups and a Process for Preparation

Patent: 5,326,826 →

Application: 07/841,532 →

Radiation-Sensitive Polymers Containing Naphthoquinone-2-Diazide-4- Sulfonyl Groups and Their Use in a Positive Working Recording Material

Patent: 5,302,488 →

Application: 07/841,545 →

Composition Containing Naphthoquinone Diazide Sulfonic Acid Mixed Esters and Radiation-Sensitive Recording Material Prepared Therewith

Patent: 5,306,595 →

Application: 07/862,603 →

Radiation-Sensitive Ester and Process for Its Preparation

Patent: 5,268,252 →

Application: 07/863,679 →

Radiation-Sensitive Composition Containing Esterification Product of (1,2-Naphthoquinone-2-Diazide)-Sulfonic Acid with 2,3,4,4-Tetrahydroxy Benzophenone and a Di- or Tri-Hydroxybenzophenone

Patent: 5,358,823 →

Application: 07/863,681 →

Substituted 1-Sulfonyloxy-2-Pyridones and Process for Preparing Them

Patent: 5,286,867 →

Application: 07/870,920 →

Negative-Working Radiation-Sensitive Mixtures, and Radiation-Sensitive Recording Material Produced with These Mixtures

Patent: 5,230,985 →

Application: 07/871,007 →

Acid-Cleavable Compounds, Positive-Working Radiation-Sensitive Mixture Containing These Compounds, and Radiation-Sensitive Recording Material Produced with This Mixture

Patent: 5,286,602 →

Application: 07/871,009 →

Positive-Working Radiation-Sensitive Mixtures, and Radiation-Sensitive Recording Materials Produced with These Mixtures

Patent: 5,229,254 →

Application: 07/871,027 →

Negative-Working Radiation-Sensitive Mixture, and Radiation-Sensitive Recording Material Produced with This Mixture

Patent: 5,227,276 →

Application: 07/871,033 →

Positive-Working Radiation Sensitive Mixture Comprising Sulfonic Acid Esters of 2,4,6-Tris-(2-Hydroxyethoxy)-[1,3,5]Triazine, and Recording Material Containing These Esters

Patent: 5,314,786 →

Application: 07/871,034 →

Positive Radiation-Sensitive Mixture and Recording Material Produced Therefrom

Patent: 5,403,697 →

Application: 07/881,329 →

Positive-Working Radiation-Sensitive Mixture and Radiation-Sensitive Recording Material Produced Therewith

Patent: 5,364,734 →

Application: 07/895,649 →

Radiation-Sensitive Mixture Containing Novel Polymers Embodying Units Composed of Amides of Alpha, Beta-Unsaturated Carboxylic Acids as Binders

Patent: 5,326,840 →

Application: 07/895,666 →

Radiation-Sensitive Sulfonic Acid Esters and Their Use

Patent: 5,298,364 →

Application: 07/895,679 →

Process for Preparing N-Tert-Butoxycarbonylmaleimide

Patent: 5,247,096 →

Application: 07/914,453 →

Negative-Working Radiation-Sensitive Mixture and Radiation-Sensitive Recording Material Produced Therewith

Patent: 5,401,608 →

Application: 07/917,364 →

Oligomeric Compounds with Acid-Labile Protective Groups Useful in Positive-Working Radiation-Sensitive Mixture

Patent: 5,354,643 →

Application: 07/920,633 →

Compounds with Acid-Labile Protective Groups Useful in Positive- Working Radiation-Sensitive Mixtures

Patent: 5,356,752 →

Application: 07/920,848 →

Radiation-Sensitive Mixture with a Polymeric Binder Containing Units of Alpha, Beta-Unsaturated Carboxamides

Patent: 5,328,973 →

Application: 07/922,507 →

Positive-Working Radiation-Sensitive Mixture and Copying Material Produced Therefrom Comprising an Alpha, Alpha-Bis(Sulfonyl) Diazo Methane as an Acid Forming Compound

Patent: 5,338,641 →

Application: 08/026,077 →

(1,2-Naphthoquinone 2-Diazide) Sulfonic Acid Esters, Radiation-Sensitive Mixture Prepared Therewith and Radiation- Sensitive Recording Material

Patent: 5,563,018 →

Application: 08/032,276 →

Positive-Working Radiation-Sensitive Mixture and Copying Material Produced Therefrom Comprising an Alpha-Carbonyl-Alpha-Sulfonyl Diazomethane, a Water-Insoluble Binder and an Acid Cleavable Compound

Patent: 5,340,682 →

Application: 08/046,484 →

Radiation-Sensitive Sulfonic Acid Esters and Their Use

Patent: 5,442,061 →

Application: 08/139,017 →

Negative-Working Radiation-Sensitive Mixture Containing Diazomethane Acid Generator and a Radiation-Sensitive Recording Material Produced Therfrom

Patent: 5,424,166 →

Application: 08/194,307 →

Aqueous Polymer Dispersions as Binders for Non-Blocking Scratch-Resistant and Chemical-Resistant Coatings

Patent: 5,596,035 →

Application: 08/339,273 →

Positive-Acting Radiation-Sensitive Mixture and Recording Material Produced Therewith