Patent Assignment
Reel/Frame 017113/0371
Assignment of Assignor's Interest
Recorded: 2005-10-17
Pages: 4
Assignors
TSUCHIYA, HAJIME
Executed: 2005-08-23
HATTORI, SEITARO
Executed: 2005-08-17
AKIYAMA, MASAHIRO
Executed: 2005-08-26
SHIOTA, ATSUSHI
Executed: 2005-09-09
Assignee
JSR CORPORATION
6-10, TSUKIJI 5-CHOME, CHUO-KU, TOKYO 104-8410, JAPAN
Covered Property
(1)
Silica-Based Film, Method of Forming the Same, Composition for Forming Insulating Film for Semiconductor Device, Interconnect Structure, and Semiconductor Device
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.