Change of Name

Recorded: 2006-01-31 Received: 2006-01-31 Pages: 5

Assignor

ASM GENITECH, INC.

Executed: 2006-01-02

Assignee

ASM GENITECH KOREA LTD.

1694-5 SINILDONG, DAEDEOGGU, DAEJEON 306-230, KRX, KOREA, REPUBLIC OF

Covered Properties (10)

Atomic layer deposition apparatus

Application: 11/318,786 →

Apparatus for depositing

Application: 10/495,156 →

Method for forming thin film

Application: 10/495,157 →

Catalyst comprising two catalytically-active metals

Application: 10/600,494 →

Plasma Enhanced Atomic Layer Deposition (Peald) Equipment and Method of Forming a Conducting Thin Film Using the Same Thereof

Application: 10/486,311 →

Thin Film Forming Method

Application: 10/297,867 →

Ultra-Dense Wavelength Division Mulitplexing/Demultiplexing Devices

Application: 10/056,487 →

Water-Dilutable Etherified Melamine-Formaldehyde Resins

Application: 10/016,095 →

Transfer Line Workpiece Inspection Apparatus and Method

Application: 09/877,766 →

Chemical Deposition Reactor and Method of Forming a Thin Film Using the Same

Application: 09/763,238 →