Assignment of Assignor's Interest

Recorded: 2006-03-10 Pages: 2

Assignor

KANG, JUNG HO

Executed: 2006-03-08

Assignee

DONGBUANAM SEMICONDUCTOR INC.

891-10, DAECHI-DONG, GANGNAM-GU, SEOUL, 135-280, KOREA, REPUBLIC OF

Covered Property (1)

Monitoring pattern for optimization of chemical mechanical polishing process of trench isolation layer and related methods

Application: 11/324,170 →

Publication: US 2006/0148204

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.