Patent Assignment
Reel/Frame 017320/0568
Assignment of Assignor's Interest
Recorded: 2006-03-09
Pages: 3
Assignors
OWA, SOICHI
Executed: 2006-02-27
MAGOME, NOBUTAKA
Executed: 2006-02-21
HIRUKAWA, SHIGERU
Executed: 2006-02-07
KUDO, YOSHIHIKO
Executed: 2006-03-01
INOUE, JIRO
Executed: 2006-02-21
KOHNO, HIROTAKA
Executed: 2006-02-15
NEI, MASAHIRO
Executed: 2006-02-07
IMAI, MOTOKATSU
Executed: 2006-02-28
NAGASAKA, HIROYUKI
Executed: 2006-02-07
SHIRAISHI, KENICHI
Executed: 2006-02-07
NISHII, YASUFUMI
Executed: 2006-02-21
TAKAIWA, HIROAKI
Executed: 2006-02-15
Assignee
NIKON CORPORATION
2-3, MARUNOUCHI 3-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property
(1)
Exposure Method, Substrate Stage, Exposure Apparatus, and Device Manufacturing Method