Exposure method, substrate stage, exposure apparatus, and device manufacturing method
In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.
1. An exposure method comprising:
exposing a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid, wherein
the side surface of the substrate is applied with liquid-repellent treatment.
2. An exposure method according to claim 1 , wherein the underside surface of the substrate is applied with liquid-repellent treatment.
3. A device manufacturing method comprising:
exposing a substrate using an exposure method according to claim 1 ; and
developing the exposed substrate.
4. An exposure method according to claim 1 , wherein the liquid-repellent treatment includes forming a thin film of a liquid-repellent material.
5. An exposure method according to claim 4 , wherein the liquid-repellent material includes a photo-sensitive material.
6. An exposure method according to claim 4 , wherein the liquid-repellent material includes a fluorine material.
7. An exposure method comprising:
exposing a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid, wherein
the underside surface of the substrate is applied with liquid-repellent treatment.
8. An exposure method according to claim 7 , wherein the liquid-repellent treatment includes forming a thin film of a liquid-repellent material.
9. An exposure method according to claim 8 , wherein the liquid-repellent material includes a photo-sensitive material.
10. An exposure method according to claim 8 , wherein the liquid-repellent material includes a fluorine material.
11. An exposure method according to claim 7 , wherein the liquid-repellent treatment is applied to a portion of the underside surface of the substrate.
12. A device manufacturing method comprising:
exposing a substrate using an exposure method according to claim 7 ; and
developing the exposed substrate.
13. A substrate stage apparatus used in a liquid immersion exposure in which a substrate is exposed by projecting an image of a pattern onto the substrate via a projection optical system and a liquid, comprising:
a movable stage which holds the substrate, the movable stage including a substrate holder to hold the substrate, a flat portion, and an inner side surface provided below the flat portion, wherein
at least a part of the flat portion is liquid-repellent, and the inner side surface faces an edge of the substrate held by the substrate holder.
14. A substrate stage apparatus according to claim 13 , wherein
the substrate holder has a peripheral wall and a plurality of supporting portions disposed inside the peripheral wall,
the substrate is held by the supporting portions by applying a negative pressure to the space surrounded by the peripheral wall, and
the top surface of the peripheral wall is liquid-repellent.
15. A substrate stage apparatus according to claim 14 , wherein the height of the peripheral wall is lower than the height of the supporting portions.
16. A substrate stage apparatus according to claim 13 , wherein
the flat portion is provided around the substrate held by the substrate holder, and the height of the flat portion is substantially equal to the height of the surface of the substrate held by the substrate holder.
17. A substrate stage apparatus according to claim 16 , wherein
the substrate holder has a peripheral wall and a supporting portion disposed inside the peripheral wall, and
holds, on the supporting portion, the substrate by applying a negative pressure to the space surrounded by the peripheral wall.
18. A substrate stage apparatus according to claim 17 , further comprising a recovery flow passage that recovers the liquid that has flowed, from between the substrate and the inner side surface, into the space outside the peripheral wall.
19. A substrate stage according to claim 17 , wherein the top surface of the peripheral wall is liquid-repellent.
20. A substrate stage apparatus according to claim 19 , wherein the peripheral wall is lower than the supporting portion.
21. A substrate stage apparatus according to claim 16 , wherein the at least a part of the inner side surface is liquid-repellent.
22. A substrate stage apparatus according to claim 16 , wherein the movable stage includes a recovery flow passage to recover a liquid that has flowed from a gap between the inner side surface and the substrate held by the substrate holder.
23. A substrate stage apparatus according to claim 16 , wherein a liquid immersion area is formed on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate, and wherein a part of the liquid immersion area is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
24. A substrate stage apparatus according to claim 16 , wherein the movable stage includes a reference to align the substrate held by the substrate holder and the pattern, the reference being provided at the flat portion.
25. A substrate stage apparatus according to claim 13 , wherein
at least a part of the inner side surface is liquid-repellent.
26. A substrate stage apparatus according to claim 25 , wherein the movable stage includes a recovery flow passage to recover a liquid that has flowed from a gap between the inner side surface and the substrate held by the substrate holder.
27. A substrate stage apparatus according to claim 25 , wherein a liquid immersion area is formed on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate, and wherein a part of the liquid immersion area is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
28. A substrate stage apparatus according to claim 13 , wherein the substrate holder includes a peripheral wall and a supporting portion disposed inside the peripheral wall, and holds the substrate on the supporting portion by applying a negative pressure to the space surrounded by the penpheral wall.
29. A substrate stage apparatus according to claim 28 , wherein at least a part of the surface of the substrate holder is liquid-repellent.
30. A substrate stage apparatus according to claim 29 , wherein the top surface of the peripheral wall is liquid-repellent.
31. A substrate stage apparatus according to claim 28 , wherein
the substrate holder is detachable, and
the movable stage has a contact surface that comes into contact with the substrate holder, and that is liquid-repellent.
32. A substrate stage apparatus according to claim 28 wherein
the substrate holder is detachable, and
the underside surface of the substrate holder is liquid-repellent.
33. A substrate stage apparatus according to claim 28 wherein
the flat portion is provided around the substrate held by the substrate holder and the height of the flat portion is substantially equal to the height of the surface of the substrate held by the substrate holder.
34. A substrate stage apparatus according to claim 28 , wherein at least a part of the inner side surface is liquid-repellent.
35. A substrate stage apparatus according to claim 28 , wherein
at least a part of the outer side surface of the peripheral wall faces the inner side surface.
36. A substrate stage apparatus according to claim 35 , wherein
the space between the inner side surface and the outer side surface of the peripheral wall is made to have a positive pressure.
37. A substrate stage apparatus according to claim 35 , wherein the pressure of the space between the inner side surface and the outer side surface of the peripheral wall is made to lower than that of the space surrounded by the peripheral wall.
38. A substrate stage apparatus according to claim 28 , wherein the movable stage includes a recovery flow passage to recover a liquid that has flowed from a gap between the inner side surface and the substrate held by the substrate holder.
39. A substrate stage apparatus according to claim 38 , wherein the recovery flow passage is provided to recover the liquid from a space under the gap.
40. A substrate stage apparatus according to claim 38 , wherein the recovery flow passage is provided to recover the liquid from a space located outside the peripheral wall.
41. A substrate stage apparatus according to claim 38 , wherein the recovery flow passage has a liquid-repellent surface.
42. A substrate stage apparatus according to claim 28 , wherein a liquid immersion area is formed on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate, and wherein a part of the liquid immersion area is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
43. A substrate stage apparatus according to claim 13 , wherein
the movable stage includes a recovery flow passage to recover a liquid that has flowed from a gap between the inner side surface and the substrate held by the substrate holder.
44. A substrate stage apparatus according to claim 43 , wherein the recovery flow passage is provided to recover the liquid from a space under the gap.
45. A substrate stage apparatus according to claim 43 , wherein the recovery flow passage has a liquid-repellent surface.
46. A substrate stage apparatus according to claim 43 , wherein a liquid immersion area is formed on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate, and wherein a part of the liquid immersion area is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
47. A substrate stage apparatus according to claim 13 , wherein the side surface of the substrate is applied with liquid-repellent treatment.
48. A substrate stage apparatus according to claim 13 , wherein the underside surface of the substrate is applied with liquid-repellent treatment.
49. A substrate stage apparatus according to claim 13 , wherein no cut portion for positioning is formed on the substrate.
50. A substrate stage apparatus according to claim 13 , wherein
the inner side surface faces the side surface of the substrate held by the substrate holder.
51. An exposure apparatus that has a substrate stage apparatus according to claim 13 .
52. A device manufacturing method that uses an exposure apparatus having a substrate stage apparatus according to claim 51 .
53. A substrate stage apparatus according to claim 13 , wherein a liquid immersion area is formed on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate, and wherein a part of the liquid immersion is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
54. A substrate stage apparatus that is movable while holding a substrate as an object to be exposed, the substrate stage comprising:
a supporting portion that supports the substrate;
a flat portion that is disposed around the substrate supported by the supporting portion and that forms substantially the same plane as the surface of the substrate; and
a gap adjustment portion for making the gap between a cut portion of the substrate supported by the supporting portion and the flat portion small.
55. A substrate stage apparatus according to claim 54 , wherein the gap adjustment portion is formed integrally with the flat portion.
56. A substrate stage apparatus according to claim 54 , wherein the gap adjustment portion is movable.
57. A substrate stage apparatus according to claim 54 , wherein
a peripheral wall is disposed around the supporting portion, and
the substrate is held on the supporting portion by applying a negative pressure to the space surrounded by the peripheral wall.
58. An exposure apparatus that has a substrate stage apparatus according to claim 54 .
59. A substrate stage apparatus comprising:
a movable stage which holds a substrate as an object to be exposed, the stage having a supporting portion that supports the substrate and a plurality of gas-suction ports for sucking and holding the substrate, wherein
the gas-sucking force near a cut portion of the substrate is made to be smaller than the gas-sucking force therearound.
60. A substrate stage apparatus according to claim 59 , wherein gas-suction ports near the cut portion of the substrate among the plurality of gas-suction ports are connected to a vacuum system provided separately from a vacuum system connected to the other gas-suction ports.
61. A substrate stage apparatus according to claim 59 , wherein the bore diameter of gas-suction ports near the cut portion of the substrate among the plurality of gas-suction ports is made to be smaller than the bore diameter of the other gas-suction ports.
62. An exposure apparatus that has a stage according to claim 59 , the stage holding a substrate is liquid immersion exposed by illuminating the substrate with an exposure light via a projection optical system and a liquid.
63. A device manufacturing method that uses an exposure apparatus according to claim 62 .
64. A substrate stage apparatus used in a liquid immersion exposure in which a substrate is exposed by projecting an image of a pattern onto the substrate via a projection optical system and a liquid, comprising:
a movable stage which holds the substrate, the movable stage including a substrate holder to hold the substrate, a flat portion, and an inner side surface provided below the flat portion,
wherein at least a part of the inner side surface is liquid-repellent, and the inner side surface faces an edge of the substrate held by the substrate holder.
65. A substrate stage apparatus according to claim 64 , wherein the flat portion is provided around the substrate held by the substrate holder, and the height of the flat portion is substantially equal to the height of the surface of the substrate held by the substrate holder.
66. A substrate stage apparatus according to claim 65 , wherein the movable stage includes a recovery flow passage to recover a liquid that has flowed from a gap between the inner side surface and the substrate held by the substrate holder.
67. A substrate stage apparatus according to claim 65 , wherein a liquid immersion area is formed on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate, and wherein a part of the liquid immersion area is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
68. A substrate stage apparatus according to claim 65 , wherein the movable stage includes a reference to align the substrate held by the substrate holder and the pattern, the reference being provided at the flat portion.
69. A substrate stage apparatus according to claim 64 , wherein the movable stage includes a recovery flow passage to recover a liquid that has flowed from a gap between the inner side surface and the substrate held by the substrate holder.
70. A substrate stage apparatus according to claim 69 , wherein the recovery flow passage is provided to recover the liquid from a space under the gap.
71. A substrate stage apparatus according to claim 69 , wherein the recovery flow passage has a liquid-repellent surface.
72. A substrate stage apparatus according to claim 69 , wherein a liquid immersion area is formed on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate, and wherein a part of the liquid immersion area is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
73. A substrate stage apparatus according to claim 64 , wherein the substrate holder includes a peripheral wall and a supporting portion disposed inside the peripheral wall, and holds the substrate on the supporting portion by applying a negative pressure to the space surrounded by the peripheral wall.
74. A substrate stage apparatus according to claim 73 , wherein the flat portion is provided around the substrate held by the substrate holder, and the height of the flat portion is substantially equal to the height of the surface of the substrate held by the substrate holder.
75. A substrate stage apparatus according to claim 73 , wherein the movable stage includes a recovery flow passage to recover a liquid that has flowed from a gap between the inner side surface and the substrate held by the substrate holder.
76. A substrate stage apparatus according to claim 75 , wherein the recovery flow passage is provided to recover the liquid from a space under the gap.
77. A substrate stage apparatus according to claim 75 , wherein the recovery flow passage is provided to recover the liquid from a space located outside the peripheral wall.
78. A substrate stage apparatus according to claim 75 , wherein the recovery flow passage has a liquid-repellent surface.
79. A substrate stage apparatus according to claim 73 , wherein a liquid immersion area is formed on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate, and wherein a part of the liquid immersion area is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
80. A substrate stage apparatus according to claim 64 , wherein the inner side surface faces a side surface of the substrate held by the substrate holder.
81. A substrate stage apparatus according to claim 64 , wherein a liquid immersion area is formed on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate, and wherein a part of the liquid immersion area is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
82. An exposure apparatus that has a substrate stage apparatus according to claim 64 .
83. A device manufacturing method that uses an exposure apparatus having a substrate stage apparatus according to claim 82 .
84. An exposure method comprising:
providing a substrate on a movable stage which includes a substrate holder to hold the substrate, a flat portion, and an inner side surface provided below the flat portion; and
exposing the substrate held by the substrate holder through a liquid,
wherein at least a part of the flat portion is liquid-repellent, and the inner side surface faces an edge of the substrate held by the substrate holder.
85. An exposure method according to claim 84 , wherein the flat portion is provided around the substrate held by the substrate holder, and the height of the flat portion is substantially equal to the height of the surface of the substrate held by the substrate holder.
86. An exposure method according to claim 84 , wherein at least a part of the inner side surface is liquid-repellent.
87. An exposure method according to claim 84 , further comprising recovering a liquid that has flowed from a gap between the inner side surface and the substrate held by the substrate holder.
88. An exposure method according to claim 84 , further comprising forming a liquid immersion area on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate.
89. An exposure method according to claim 88 , wherein a part of the liquid immersion is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
90. An exposure method according to claim 84 , wherein the substrate has a liquid-repellent surface.
91. An exposure method according to claim 84 , wherein the substrate has a liquid-repellent side surface.
92. An exposure method according to claim 84 , wherein the substrate has a liquid-repellent underside surface.
93. A device manufacturing method comprising:
exposing a substrate though a liquid using an exposure method defined in claim 84 ; and
developing the exposed substrate.
94. An exposure method comprising:
providing a substrate on a movable stage which includes a substrate holder to hold the substrate, a flat portion, and an inner side surface provided below the flat portion; and
exposing the substrate held by the substrate holder through a liquid,
wherein at least a part of the inner side surface is liquid-repellent, and the inner side surface faces an edge of the substrate held by the substrate holder.
95. An exposure method according to claim 94 , wherein the flat portion is provided around the substrate held by the substrate holder, and the height of the flat portion is substantially equal to the height of the surface of the substrate held by the substrate holder.
96. An exposure method according to claim 94 , further comprising recovering a liquid that has flowed from a gap between the inner side surface and the substrate held by the substrate holder.
97. An exposure method according to claim 94 , further comprising forming a liquid immersion area on only a portion of the surface of the substrate held by the substrate holder so as to expose the surface of the substrate.
98. An exposure method according to claim 97 , wherein a part of the liquid immersion is formed on the flat portion when exposing a peripheral portion of the surface of the substrate.
99. An exposure method according to claim 94 , wherein the substrate has a liquid-repellent surface.
100. An exposure method according to claim 94 , wherein the substrate has a liquid-repellent side surface.
101. An exposure method according to claim 94 , wherein the substrate has a liquid-repellent underside surface.
102. A device manufacturing method comprising:
exposing a substrate though a liquid using an exposure method defined in claim 94 ; and
developing the exposed substrate.