IP Library Assignment 017428/0299
Patent Assignment
Reel/Frame 017428/0299

Assignment of Assignor's Interest

Recorded: 2006-04-06 Pages: 2
Assignor
KIM, SUNOO
Executed: 2006-03-24
Assignee
INFINEON TECHNOLOGIES NORTH AMERICA CORP.
1730 NORTH FIRST STREET, SAN JOSE, CALIFORNIA, 95112
Covered Property (1)
Methods of Forming Dual-Damascene Interconnect Structures on Semiconductor Substrates Using Multiple Planarization Layers Having Different Porosity Characteristics
Patent: 7,365,025 →
Application: 11/348,428 →
Publication: US 2007/0184649
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Feb 6, 2006
From: LEE, KYOUNG WOO; CHOI, SEUNG-MAN; KU, JA-HUM; PARK, KI-CHUL
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 017548/0439 →
Assignment of Assignor's Interest Apr 17, 2006
From: INFINEON TECHNOLOGIES NORTH AMERICA CORP.
To: INFINEON TECHNOLOGIES AG
Reel/Frame 017479/0018 →