IP Library Assignment 017481/0383
Patent Assignment
Reel/Frame 017481/0383

Assignment of Assignor's Interest

Recorded: 2006-01-23 Pages: 3
Assignors
TAKAOKA, OSAMU
Executed: 2005-12-16
HAGIWARA, RYOJI
Executed: 2005-12-16
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property (1)
Electron Beam Processing Method
Patent: 7,018,683 →
Application: 10/867,865 →
Publication: US 2005/0276932
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →