IP Library Assignment 017788/0837
Patent Assignment
Reel/Frame 017788/0837

Assignment of Assignor's Interest

Recorded: 2006-04-17 Pages: 3
Assignors
MURAKI, MASATO
Executed: 2006-04-04
OHTA, HIROYA
Executed: 2006-04-10
Assignees
CANON KABUSHIKIK KAISHA
3-30-2, SHIMOMARUKO, OHTA-KU, TOKYO, JAPAN
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Aberration Measuring Apparatus for Charged Particle Beam Optical System, Charged Particle Beam Lithography Machine Having the Aberration Measuring Apparatus, and Device Fabrication Method Using the Apparatus
Patent: 7,378,671 →
Application: 11/337,603 →
Publication: US 2006/0169898
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →