Patent Assignment
Reel/Frame 017839/0759
Assignment of Assignor's Interest
Recorded: 2006-06-23
Pages: 3
Assignor
KITTL, JORGE A
Executed: 2006-06-19
Assignee
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC)
KAPELDREEF 75, LEUVEN, 3001, BELGIUM
Covered Property
(1)
Method for forming fully silicided gates and devices obtained thereof
Application:
11/434,434 →
Publication:
US 2006/0258156
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.