IP Library Assignment 017960/0800
Patent Assignment
Reel/Frame 017960/0800

Assignment of Assignor's Interest

Recorded: 2006-07-19 Pages: 4
Assignors
KITTL, JORGE ADRIAN
Executed: 2006-07-13
LAUWERS, ANNE
Executed: 2006-07-18
VELOSO, ANABELA
Executed: 2006-07-13
KOTTANTHARAYIL, ANIL
Executed: 2006-07-13
VAN DAL, MARCUS JOHANNES HENRICUS
Executed: 2006-07-13
Assignees
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC)
KAPELDREEF 75, LEUVEN, 3001, BELGIUM
TEXAS INSTRUMENTS INCORPORATED
MS 3999, P.O. BOX 655474, DALLAS, TEXAS, 73265
KONINKLIJKE PHILLIPS ELECTRONICS
GROENEWOUDSEWEG 1, EIDEHOVEN, 5621 BA, NETHERLANDS
Covered Property (1)
Method for Forming Dual Fully Silicided Gates and Devices with Dual Fully Silicided Gates
Application: 11/382,986 →
Publication: US 2006/0263961
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 13, 2009
From: KONINKLIJKE PHILIPS ELECTRONICS N.V.
To: NXP B.V.
Reel/Frame 022092/0572 →
Change of Name Dec 4, 2009
From: INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC)
To: IMEC
Reel/Frame 023594/0846 →