Patent Assignment
Reel/Frame 018160/0627
RELEASE OF SECURITY INTEREST IN PATENTS
Recorded: 2006-08-24
Received: 2006-08-24
Pages: 17
Assignor
ORIX VENTURE FINANCE LLC
Executed: 2006-07-05
Assignees
GOLDFINGER TECHNOLOGIES, LLC
6330 HEDGEWOOD DRIVE, #150, ALLENTOWN, PA, 18106, UNITED STATES
AKRION INC.
6330 HEDGEWOOD DRIVE, #150, ALLENTOWN, PA, 18106, UNITED STATES
Covered Applications
(56)
Apparatus and method for cleaning and drying a hydrophobic surface of a substrate
App. No. 60/809,656
→
Spray jet cleaning apparatus and method
App. No. 60/798,831
→
APPARATUS FOR MEGASONIC PROCESSING OF AN ARTICLE
App. No. 11/386,634
→
TRANSDUCER ASSEMBLY FOR MAGASONIC PROCESSING OF AN ARTICLE AND APPARATUS UTILIZING THE SAME
App. No. 11/375,907
→
Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices
App. No. 11/370,707
→
Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices
App. No. 11/370,361
→
Apparatus and method for transmitting energy through a non-reactive transmitter bonded to a transducer and use of the same to process substrates
App. No. 60/762,827
→
Backside cleaning of substrates
App. No. 60/760,820
→
System and method for drying a rotating substrate
App. No. 60/759,948
→
APPARATUS AND METHOD FOR REMOVING TRACE AMOUNTS OF LIQUID FROM SUBSTRATES DURING SINGLE-SUBSTRATE PROCESSING
App. No. 11/266,402
→
System and method of processing substrates using a sub-ambient process solution and sonic energy
App. No. 60/724,495
→
System and method of powering a sonic energy source and use of the same to process substrates
App. No. 11/227,705
→
Reduced pressure irradiation processing method and apparatus
App. No. 11/178,923
→
Method and apparatus for creating ozonated process solutions having high ozone concentration
App. No. 11/177,147
→
System and method for pre-gate cleaning of substrates
App. No. 11/176,406
→
System and method of cleaning substrates using high frequency megasonics and/or cavitation control
App. No. 60/690,586
→
MEMBRANE DRYER
App. No. 10/951,009
→
Apparatus for carrying reticles and method of using the same to process reticles
App. No. 10/931,441
→
PROCESS SEQUENCE FOR PHOTORESIST STRIPPING AND/OR CLEANING OF PHOTOMASKS FOR INTEGRATED CIRCUIT MANUFACTURING
App. No. 10/909,764
→
SYSTEM AND METHOD FOR POINT-OF-USE FILTRATION AND PURIFICATION OF FLUIDS USED IN SUBSTRATE PROCESSING
App. No. 10/895,511
→
Megasonic cleaner and dryer
App. No. 10/865,440
→
MEGASONIC CLEANER AND DRYER
App. No. 10/864,927
→
MEGASONIC CLEANING USING SUPERSATURATED CLEANING SOLUTION
App. No. 10/864,929
→
APPARATUS AND METHODS FOR REDUCING DAMAGE TO SUBSTRATES DURING MEGASONIC CLEANING PROCESSES
App. No. 10/760,596
→
SONIC-ENERGY CLEANER SYSTEM WITH GASIFIED FLUID
App. No. 10/742,214
→
METHOD OF CLEANING A SIDE OF A THIN FLAT SUBSTRATE BY APPLYING SONIC ENERGY TO THE OPPOSITE SIDE OF THE SUBSTRATE
App. No. 10/726,774
→
SUBSTRATE PROCESS TANK WITH ACOUSTICAL SOURCE TRANSMISSION AND METHOD OF PROCESSING SUBSTRATES
App. No. 10/699,042
→
METHOD FOR REMOVAL OF PHOTORESIST USING SPARGER
App. No. 10/634,440
→
PROCESS AND APPARATUS FOR REMOVAL OF PHOTORESIST FROM SEMICONDUCTOR WAFERS USING SPRAY NOZZLES
App. No. 10/366,054
→
CAPILLARY DRYING OF SUBSTRATES
App. No. 10/358,636
→
MEGASONIC CLEANING SYSTEM WITH BUFFERED CAVITATION METHOD
App. No. 10/341,425
→
METHOD OF PROCESSING SUBSTRATES USING PRESSURIZED MIST GENERATION
App. No. 10/304,583
→
WAFER CLEANING
App. No. 10/243,463
→
WAFER CLEANING
App. No. 10/243,486
→
PROBER FOR TESTING LIGHT-EMITTING DEVICES ON A WAFER
App. No. 10/193,522
→
MEGASONIC CLEANER AND DRYER SYSTEM
App. No. 10/171,430
→
Megasonic cleaner and dryer system
App. No. 10/171,494
→
Method of applying liquid to a megasonic apparatus for improved cleaning control
App. No. 10/171,431
→
STACKABLE PROCESS CHAMBERS
App. No. 10/171,429
→
MEGASONIC CLEANER AND DRYER
App. No. 10/171,426
→
RECIPROCATING MEGASONIC PROBE
App. No. 10/140,029
→
NEXTGEN WET PROCESS TANK
App. No. 10/117,778
→
MEMBRANE DRYER
App. No. 10/117,739
→
CHEMICAL CONCENTRATION CONTROL DEVICE
App. No. 10/117,725
→
PROCESS TANK WITH PRESSURIZED MIST GENERATION
App. No. 10/117,768
→
DRYING VAPOR GENERATION
App. No. 10/098,847
→
CLEANING AND DRYING METHOD AND APPARATUS
App. No. 10/091,011
→
CABLE CLAMP
App. No. 10/073,551
→
MEGASONIC PROBE ENERGY DIRECTOR
App. No. 10/059,682
→
METHOD AND SYSTEM FOR CHEMICAL INJECTION IN SILICON WAFER PROCESSING
App. No. 10/053,364
→
LOW PROFILE WAFER CARRIER
App. No. 10/053,449
→
SYSTEM FOR REMOVAL OF PHOTORESIST USING SPARGER
App. No. 10/052,823
→
PARTICLE BARRIER DRAIN
App. No. 10/014,121
→
WAFER CLEANING METHOD
App. No. 09/953,504
→
MEGASONIC PROBE ENERGY ATTENUATOR
App. No. 09/922,509
→
MEGASONIC CLEANER PROBE SYSTEM WITH GASIFIED FLUID
App. No. 09/906,384
→