IP Library Assignment 018284/0325
Patent Assignment
Reel/Frame 018284/0325

Assignment of Assignor's Interest

Recorded: 2006-09-21 Pages: 3
Assignor
HEBRAS, XAVIER
Executed: 2006-08-16
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES S.A.
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES, BERNIN, 38190, FRANCE
Covered Property (1)
Methods of Forming a Layer of Material on a Substrate and Structures Formed Therefrom
Patent: 7,585,749 →
Application: 11/504,256 →
Publication: US 2007/0210307
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 1, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 027793/0535 →