Patent Assignment
Reel/Frame 027793/0535
Change of Name
Recorded: 2012-03-01
Pages: 7
Assignor
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Executed: 2011-09-06
Assignee
SOITEC
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES, 38190 BERNIN, FRANCE
Covered Properties
(15)
Method of Fabricating Soi Wafer by Hydrogen Ion Delamination Method and Soi Wafer Fabricated by the Method
Patent:
6,372,609 →
Application:
09/555,687 →
Forming Structures That Include a Relaxed or Pseudo-Relaxed Layer on a Substrate
Forming Structures That Include a Relaxed or Pseudo-Relaxed Layer on a Substrate
Process and Equipment for Bonding by Molecular Adhesion
Methods of Forming a Layer of Material on a Substrate and Structures Formed Therefrom
Process for Fabricating a Structure for Epitaxy Without an Exclusion Zone
Equipment for Bonding by Molecular Adhesion
Process for Bonding by Molecular Adhesion
Methods of Forming a Layer of Material on a Substrate and Structures Formed Therefrom
Method of Fabricating an Epitaxially Grown Layer on a Composite Structure
Transfer of High Temperature Wafers
Forming Structures That Include a Relaxed or Pseudo-Relaxed Layer on a Substrate
Oxidation After Oxide Dissolution
Annealing Process for Annealing a Structure
Forming Structures That Include a Relaxed or Pseudo-Relaxed Layer on a Substrate
Related Assignments
(13)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jun 2, 2000
From: AGA, HIROJI; TATE, NAOTO; MITANI, KIYOSHI
To: SHIN-ETSU HANDOTAI CO., LTD.; SOITEC S.A.
Reel/Frame 010888/0780 →
Correction of Previously Recorded Assignment
Dec 28, 2000
From: AGA, HIROJI; TATE, NAOTO; MITANI, KIYOSHI
To: SHIN-ETSU HANDOTAI CO., LTD.; S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Reel/Frame 011395/0213 →
Assignment of Assignor's Interest
Jun 3, 2004
From: GHYSELEN, BRUNO; MAZURE, CARLOS; ARENE, EMMANUEL
To: S.O.I. TEC SILICON ON INSULATOR TECHNOLOGIES S.A.
Reel/Frame 014687/0073 →
Assignment of Assignor's Interest
Apr 10, 2006
From: KERDILES, SEBASTIEN; DURET, CARINE; VAUFREDAZ, ALEXANDRE; METRAL, FREDERIC
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES S.A.
Reel/Frame 017447/0676 →
Assignment of Assignor's Interest
Sep 21, 2006
From: HEBRAS, XAVIER
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES S.A.
Reel/Frame 018284/0325 →
Assignment of Assignor's Interest
Aug 14, 2008
From: ARENA, CHANTAL; LETERTRE, FABRICE
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Reel/Frame 021388/0637 →
Assignment of Assignor's Interest
Apr 9, 2010
From: FAURE, BRUCE; MARCOVECCHIO, ALEXANDRA
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Reel/Frame 024214/0447 →
Assignment of Assignor's Interest
May 20, 2010
From: TISCHLER, MICHAEL ALBERT; BERTRAM, RONALD THOMAS, JR.
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Reel/Frame 024419/0057 →
Assignment of Assignor's Interest
Aug 5, 2010
From: KONONCHUK, OLEG; CELLER, GEORGE K.
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Reel/Frame 024798/0303 →
Assignment of Assignor's Interest
Feb 15, 2011
From: SOUSBIE, NICOLAS; ASPAR, BERNARD; BARGE, THIERRY; LAGAHE BLANCHARD, CHRYSTELLE
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Reel/Frame 025808/0801 →
Assignment of Assignor's Interest
Nov 2, 2011
From: KERDILES, SEBASTIEN; DURET, CARINE; VAUFREDAZ, ALEXANDRE; METRAL, FREDERIC
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Reel/Frame 027165/0612 →
Assignment of Assignor's Interest
Feb 28, 2012
From: HEBRAS, XAVIER
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Reel/Frame 027773/0321 →
Assignment of Assignor's Interest
Feb 28, 2012
From: GHYSELEN, BRUNO; MAZURE, CARLOS; ARENE, EMMANUEL
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
Reel/Frame 027772/0620 →