IP Library Assignment 027772/0620
Patent Assignment
Reel/Frame 027772/0620

Assignment of Assignor's Interest

Recorded: 2012-02-28 Pages: 5
Assignors
GHYSELEN, BRUNO
Executed: 2004-02-24
MAZURE, CARLOS
Executed: 2004-02-18
ARENE, EMMANUEL
Executed: 2004-02-25
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES, 38190 BERNIN, FRANCE
Covered Properties (3)
Forming Structures That Include a Relaxed or Pseudo-Relaxed Layer on a Substrate
Patent: 7,736,988 →
Application: 11/345,495 →
Publication: US 2006/0128117
Forming Structures That Include a Relaxed or Pseudo-Relaxed Layer on a Substrate
Patent: 7,919,393 →
Application: 12/769,299 →
Publication: US 2010/0210090
Forming Structures That Include a Relaxed or Pseudo-Relaxed Layer on a Substrate
Patent: 8,173,512 →
Application: 13/080,436 →
Publication: US 2011/0217825
Related Assignments (1)
Other recorded transfers of the patents in this record — the chain of ownership.
Change of Name Mar 1, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 027793/0535 →