IP Library Assignment 018340/0218
Patent Assignment
Reel/Frame 018340/0218

Assignment of Assignor's Interest

Recorded: 2006-09-22 Pages: 3
Assignor
TANAKA, TAKUJI
Executed: 2006-09-04
Assignee
FUJITSU LIMITED
1-1, KAMIKODANAKA 4-CHOME, NAKAHARA-KU, KAWASAKI-SHI, KANAGAWA 211-8588, JAPAN
Covered Property (1)
Semiconductor Device Manufacturing Method Including Oblique Ion Implantation Process and Reticle Pattern Forming Method
Patent: 7,579,246 →
Application: 11/524,945 →
Publication: US 2007/0224755
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 9, 2008
From: FUJITSU LIMITED
To: FUJITSU MICROELECTRONICS LIMITED
Reel/Frame 021976/0089 →
Change of Name Sep 27, 2010
From: FUJITSU MICROELECTRONICS LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 025046/0478 →
Assignment of Assignor's Interest Apr 27, 2015
From: FUJITSU SEMICONDUCTOR LIMITED
To: SOCIONEXT INC.
Reel/Frame 035508/0469 →