IP Library › Assignment 018509/0222
Patent Assignment
Reel/Frame 018509/0222

Assignment of Assignor's Interest

Recorded: 2006-11-13 Pages: 3
Assignors
YAMAGUCHI, TADASHI
Executed: 2006-09-26
KASHIHARA, KEIICHIRO
Executed: 2006-09-26
OKUDAIRA, TOMONORI
Executed: 2006-09-26
TSUTSUMI, TOSHIAKI
Executed: 2006-09-26
Assignee
RENESAS TECHNOLOGY CORP.
4-1, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Method of Manufacturing Semiconductor Device Carrying Out Ion Implantation Before Silicide Process
Patent: 7,696,050 →
Application: 11/537,208 →
Publication: US 2007/0077736
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 1, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024915/0526 →
Merger Sep 1, 2010
From: RENESAS TECHNOLOGY CORP.
To: NEC ELECTRONICS CORPORATION
Reel/Frame 024915/0556 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →