Patent Assignment
Reel/Frame 018921/0257
Assignment of Assignor's Interest
Recorded: 2007-02-22
Pages: 2
Assignors
ONO, HIROSHI
Executed: 2006-12-10
ASHIZAWA, TORANOSUKE
Executed: 2006-12-10
KAMIGATA, YASUO
Executed: 2006-12-10
Assignee
HITACHI CHEMICAL CO., LTD.
1-1, NISHISHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, 163-0449, JAPAN
Covered Property
(1)
Polishing Slurry for Polishing Aluminum Film and Polishing Method for Polishing Aluminum Film Using the Same
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →