IP Library Assignment 018967/0287
Patent Assignment
Reel/Frame 018967/0287

Assignment of Assignor's Interest

Recorded: 2007-02-21 Pages: 7
Assignors
WATANABE, YUKIMUNE
Executed: 2007-02-16
MISE, NOBUYUKI
Executed: 2007-02-09
MIGITA, SHINJI
Executed: 2007-02-08
Assignees
SEIKO EPSON CORPORATION
4-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, JAPAN
RENESAS TECHNOLOGY CORPORATION
4-1, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Method of Nickel Disilicide Formation and Method of Nickel Disilicate Source/Drain Formation
Patent: 7,947,560 →
Application: 11/708,614 →
Publication: US 2007/0202692
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger and Change of Name Sep 9, 2014
From: RENESAS TECHNOLOGY CORP.; NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 033698/0648 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →