Patent Assignment
Reel/Frame 019089/0025
Assignment of Assignor's Interest
Recorded: 2007-03-22
Pages: 2
Assignors
TANAKA, TOSHIHIKO
Executed: 2007-02-13
TERASAWA, TSUNEO
Executed: 2007-02-13
TEZUKA, YOSHIHIRO
Executed: 2007-02-14
Assignee
RENESAS TECHNOLOGY CORPORATION.
4-1, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property
(1)
Method and System of Defect Inspection for Mask Blank and Method of Manufacturing Semiconductor Device Using the Same
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Correct Assignment to Correct Assignee Name; Original Assignment Recorded on 3/22/2007, Reel 019089, Frame 0025-0026.
Jan 13, 2010
From: TANAKA, TOSHIHIKO; TERASAWA, TSUNEO; TEZUKA, YOSHIHIRO
To: RENESAS TECHNOLOGY CORP.
Reel/Frame 023807/0885 →
Merger
Sep 10, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024982/0148 →
Change of Address
Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →