IP Library › Assignment 019311/0380
Patent Assignment
Reel/Frame 019311/0380

Assignment of Assignor's Interest

Recorded: 2007-05-11 Pages: 2
Assignors
TAKAHASHI, KAZUE
Executed: 2007-03-23
TAMURA, HITOSHI
Executed: 2007-03-23
TANAKA, MOTOHIRO
Executed: 2007-03-23
YOSHIGAI, MOTOHIKO
Executed: 2007-03-23
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI, 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 7,955,514 →
Application: 11/679,926 →
Publication: US 2008/0169065
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →