Document Previously Recorded at Reel 018155 Frame 0640 Contained Errors in Patent Application Number 11/407,273. Document Rerecorded to Correct Errors on Stated Reel.

Recorded: 2007-06-05 Pages: 4

Assignors

CHEN, JANG FUNG

Executed: 2006-07-11

HSU, DUAN-FU STEPHEN

Executed: 2006-07-11

VAN DEN BROEKE, DOUGLAS

Executed: 2006-07-11

Assignee

ASML MASKTOOLS B.V

P.O. BOX 324, 5500 AH VELDHOVEN, NETHERLANDS

Covered Property (1)

Method, Program Product and Apparatus for Performing Double Exposure Lithography

Patent: 7,681,171 →

Application: 11/402,273 →

Publication: US 2006/0277521

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.