Patent Assignment
Reel/Frame 019521/0648
Merger
Recorded: 2007-07-06
Pages: 5
Assignor
TOSHIBA CERAMICS CO., LTD.
Executed: 2007-06-01
Assignee
COVALENT MATERIALS CORPORATION
6-3, OHSAKI 1-CHOME, SHINAGAWA-KU, TOKYO, JAPAN
Covered Properties
(3)
Substrates for growth of chemical compound semiconductors, chemical compound semiconductors using the substrates and processes for producing thereof
Application:
10/953,867 →
Publication:
US 2005/0263754
Process of Producing Silicon Wafer
Arsenic Dopants for Pulling of Silicon Single Crystal, Process for Producing Thereof and Process for Producing Silicon Single Crystal Using Thereof
Application:
11/756,976 →
Publication:
US 2007/0227440
Related Assignments
(4)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 4, 2005
From: KOMIYIMA, JUN; ABE, YOSHIHISA; SUZUKI, SHUNITI; NAKANISHI, HIDEO
To: TOSHIBA CERAMICS CO., LTD.
Reel/Frame 016123/0609 →
Assignment of Assignor's Interest
Aug 19, 2005
From: HIRANO, YUMIKO
To: TOSHIBA CERAMICS CO., LTD.
Reel/Frame 016886/0542 →
Assignment of Assignor's Interest
Mar 11, 2013
From: COVALENT MATERIALS CORPORATION
To: COVALENT SILICON CORPORATION
Reel/Frame 029962/0497 →
Change of Name
Mar 13, 2013
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 029991/0421 →