Patent Assignment
Reel/Frame 020198/0531
Assignment of Assignor's Interest
Recorded: 2007-12-05
Pages: 7
Assignors
LIU, JINPING
Executed: 2007-10-08
ONG, BEN
Executed: 2007-10-08
ZHANG, ZHENGQUAN
Executed: 2007-10-08
LEE, JAE GON
Executed: 2007-10-08
WONG, LYDIA
Executed: 2007-10-10
YANG, BIN
Executed: 2007-09-30
SEE, K.H. ALEX
Executed: 2007-10-08
ZHOU, MEISHENG
Executed: 2007-10-08
HSIA, LIANG CHOO
Executed: 2007-10-15
Assignee
CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
60 WOODLANDS INDUSTRIAL PARK D, STREET TWO, SINAPORE, 738406, SINGAPORE
Covered Property
(1)
Method of Fabricating a Nitrogenated Silicon Oxide Layer and Mos Device Having Same
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Aug 9, 2011
From: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
To: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
Reel/Frame 026723/0879 →
Change of Name
Aug 9, 2011
From: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 026723/0908 →
Security Agreement
Nov 27, 2018
From: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
To: WILMINGTON TRUST, NATIONAL ASSOCIATION
Reel/Frame 047660/0203 →
Release of Security Interest
Nov 19, 2020
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 054481/0673 →