Patent Assignment
Reel/Frame 020219/0592
Assignment of Assignor's Interest
Recorded: 2007-12-10
Pages: 4
Assignors
OHMI, TADAHIRO
Executed: 2007-12-03
TERAMOTO, AKINOBU
Executed: 2007-11-26
HONDA, MINORU
Executed: 2007-10-24
NAKANISHI, TOSHIO
Executed: 2007-10-24
Assignees
TOHOKU UNIVERSITY
1-1, KATAHIRA, 2-CHOME, AOBA-KU, SENDAI-SHI, MIYAGI, 980-8577, JAPAN
TOKYO ELECTRON LIMITED
3-6, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-8481, JAPAN
Covered Property
(1)
Plasma Nitriding Method, Method for Manufacturing Semiconductor Device and Plasma Processing Apparatus