Patent Assignment
Reel/Frame 020279/0987
Re-Record to Correct a Document Previously at Reel 019872, Frame 0735. (Change of Name)
Recorded: 2007-12-19
Pages: 2
Assignor
SUMITOMO EATON NOVA, CORPORATION
Executed: 2007-08-31
Assignee
SEN CORPORATION, AN SHI AND AXCELIS COMPANY
10-1 YOGA 4-CHOME, SETAGAYA-KU, TOKYO, JAPAN
Covered Properties
(4)
Detection Method of Coating Film Thickness and Ion Implantation Equipment Using This Method
Patent:
6,663,791 →
Application:
09/632,039 →
Ion Beam Mass Separation Filter, Mass Separation Method Thereof and Ion Source Using the Same
Ion Source Apparatus and Cleaning Optimized Method Thereof
Ion Source Apparatus and Electronic Energy Optimized Method Therefor
Related Assignments
(7)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jun 4, 2004
From: MURATA, HIROHIKO; SATO, MASATERU
To: SUMITOMO EATON NOVA CORPORATION
Reel/Frame 015440/0651 →
Assignment of Assignor's Interest
Jun 11, 2004
From: MURATA, HIROHIKO; SOTO, MASATERU
To: SUMITOMO EATON NOVA CORPORATION
Reel/Frame 015466/0604 →
Change of Name
Jul 9, 2007
From: SUMITOMO EATON NOVA, CORPORATION
To: SEN CORPORATION
Reel/Frame 019531/0138 →
Change of Name
Jul 9, 2007
From: SUMITOMO EATON NOVA, CORPORATION
To: SEN CORPORATION
Reel/Frame 019531/0710 →
Change of Name
Jul 9, 2007
From: SUMITOMO EATON NOVA, CORPORATION
To: SEN CORPORATION
Reel/Frame 019531/0391 →
Change of Name
Jul 9, 2007
From: SUMITOMO EATON NOVA, CORPORATION
To: SEN CORPORATION
Reel/Frame 019531/0013 →
Correct Previous Assignment Recorded at 019531/0138, 019531/0013, 019531/0391 and 019531/0710.
Aug 31, 2007
From: SUMITOMO EATON NOVA CORPORATION
To: SEN CORPORATION, AN SHI AND EXCELIS COMPANY
Reel/Frame 019872/0735 →