IP Library Assignment 020294/0280
Patent Assignment
Reel/Frame 020294/0280

Assignment of Assignor's Interest

Recorded: 2007-12-27 Pages: 3
Assignors
ISHIKAWA, KENJI
Executed: 2007-11-20
SHIDO, HIDEHARU
Executed: 2007-11-20
NAGATA, TAKEO
Executed: 2007-11-20
KURAHASHI, TERUO
Executed: 2007-11-20
MISHIMA, YASUYOSHI
Executed: 2007-11-20
Assignee
FUJITSU LIMITED
1-1, KAMIKODANAKA 4-CHOME, NAKAHARA-KU, KAWASAKI-SHI, KANAGAWA, 211-8588, JAPAN
Covered Property (1)
Fabrication Process of a Semiconductor Device to Form Ultrafine Patterns Smaller Than Resolution Limit of Exposure Apparatus
Patent: 7,968,466 →
Application: 11/945,547 →
Publication: US 2008/0124933
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 9, 2008
From: FUJITSU LIMITED
To: FUJITSU MICROELECTRONICS LIMITED
Reel/Frame 021976/0089 →
Change of Name Jul 9, 2010
From: FUJITSU MICROELECTRONICS LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 024651/0744 →
Change of Address Dec 23, 2016
From: FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 041188/0401 →