Change of Name

Recorded: 2008-02-12 Pages: 12

Assignor

ANELVA CORPORATION

Executed: 2007-08-28

Assignee

CANON ANELVA CORPORATION

2-5-1 KURIGI, ASAO-KU, KAWASAKI-SHI, KANAGAWA, JAPAN

Covered Properties (4)

Semiconductor Thin Film Forming System

Application: 11/678,527 →

Publication: US 2007/0166945

Remote Plasma Apparatus for Processing Substrate with Two Types of Gases

Patent: 7,392,759 →

Application: 10/978,150 →

Publication: US 2005/0087140

Remote Plasma Apparatus for Processing Substrate with Two Types of Gases

Patent: 7,709,063 →

Application: 11/620,518 →

Publication: US 2007/0110918

Semiconductor Thin Film Forming System

Patent: 7,312,418 →

Application: 11/021,306 →

Publication: US 2005/0109743

Related Assignments (1)

Other recorded transfers of the patents in this record — the chain of ownership.