IP Library › Assignment 020590/0019
Patent Assignment
Reel/Frame 020590/0019

Assignment of Assignor's Interest

Recorded: 2008-03-03 Pages: 3
Assignors
BYKANOV, ALEXANDER N.
Executed: 2008-02-12
BRANDT, DAVID C.
Executed: 2008-02-14
FOMENKOV, IGOR V.
Executed: 2008-02-11
PARTLO, WILLIAM N.
Executed: 2008-02-11
Assignee
CYMER, INC.
17075 THORNMINT COURT, LEGAL DEPT., MS/4-2D, SAN DIEGO, CALIFORNIA, 92127
Covered Property (1)
System Managing Gas Flow Between Chambers of an Extreme Ultraviolet (Euv) Photolithography Apparatus
Patent: 7,812,329 →
Application: 12/002,073 →
Publication: US 2009/0154642
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Mar 12, 2014
From: CYMER, INC.
To: CYMER, LLC
Reel/Frame 032420/0153 →
Assignment of Assignor's Interest May 9, 2014
From: CYMER, LLC
To: ASML NETHERLANDS B.V.
Reel/Frame 032860/0748 →