IP Library Assignment 021362/0441
Patent Assignment
Reel/Frame 021362/0441

Assignment of Assignor's Interest

Recorded: 2008-08-08 Pages: 3
Assignor
IMAI, SHINICHI
Executed: 2008-07-24
Assignee
ADVANCED MASK INSPECTION TECHNOLOGY, INC.
8, SHINSUGITA-CHO, ISOGO-KU, YOKOHAMA-SHI, KANAGAWA, 235-0032, JAPAN
Covered Property (1)
Beam Irradiation Apparatus with Deep Ultraviolet Light Emission Device for Lithographic Pattern Inspection System
Patent: 7,781,749 →
Application: 12/187,770 →
Publication: US 2009/0084989
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 20, 2010
From: ADVANCED MASK INSPECTION TECHNOLOGY INC.
To: KABUSHIKI KAISHA TOSHIBA; NEC CORPORATION
Reel/Frame 025008/0164 →
Assignment of Assignor's Interest Aug 8, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043482/0364 →
Merger and Change of Name Aug 19, 2021
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 057224/0091 →
Change of Name Aug 19, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 057224/0641 →