Patent Assignment
Reel/Frame 057224/0641
Change of Name
Recorded: 2021-08-19
Pages: 58
Assignor
TOSHIBA MEMORY CORPORATION
Executed: 2019-10-01
Assignee
KIOXIA CORPORATION
1-21, SHIBAURA 3-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties
(35)
Die-To-Die Photomask Defect Detection Using Region Data to Modify Inspection Thresholds
Method of Operating Laser Light Source
Photomask Inspection Apparatus Comparing Optical Proximity Correction Patterns to Minimum and Maximum Limits
Die-To-Database Photomask Defect Detection Using Region Data to Modify Inspection Thresholds
Sample Inspection Apparatus, Image Alignment Method, and Program-Recorded Readable Recording Medium
Workpiece Inspection Apparatus, Workpiece Inspection Method and Computer-Readable Recording Medium Storing Program
Pattern Inspection Apparatus
Light Amount Measurement Device and Light Amount Measurement Method
Pattern Inspection System Using Image Correction Scheme with Object-Sensitive Automatic Mode Switchability
Image Correcting Method
Image Correction Method
Pattern Inspection Method and Apparatus with High-Accuracy Pattern Image Correction Capability
Image Density-Adapted Automatic Mode Switchable Pattern Correction Scheme for Workpiece Inspection
Pattern Inspection Method and Apparatus Using Linear Predictive Model-Based Image Correction Technique
Pattern Inspection Apparatus and Method with Local Critical Dimension Error Detectability
Pattern Inspection Apparatus and Method with Enhanced Test Image Correctability Using Frequency Division Scheme
Image Correction Method and Apparatus for Use in Pattern Inspection System
Target Workpiece Inspection Apparatus, Image Alignment Method, and Computer-Readable Recording Medium with Program Recorded Thereon
Pattern Inspection Apparatus, Image Alignment Method, Displacement Amount Estimation Method, and Computer-Readable Recording Medium with Program Recorded Thereon
Pattern Inspection Apparatus
Pattern Inspection Apparatus, Corrected Image Generation Method, and Computer-Readable Recording Medium Storing Program
Level Detection Apparatus
Lighting Optical Apparatus and Sample Inspection Apparatus
Reticle Defect Inspection Apparatus and Inspection Method Using Thereof
Reticle Defect Inspection Apparatus and Reticle Defect Inspection Method
Beam Irradiation Apparatus with Deep Ultraviolet Light Emission Device for Lithographic Pattern Inspection System
Mask Blank for Euv Exposure and Mask for Euv Exposure
Pattern Inspection Apparatus, Pattern Inspection Method, and Computer-Readable Recording Medium Storing a Program
Pattern Image Correcting Apparatus, Pattern Inspection Apparatus, and Pattern Image Correcting Method
Ultrafine Pattern Discrimination Using Transmitted/Reflected Workpiece Images for Use in Lithography Inspection System
Ultrafine Lithography Pattern Inspection Using Multi-Stage Tdi Image Sensors with False Image Removability
Light Polarization Control Using Serial Combination of Surface-Segmented Half Wavelength Plates
Image Density-Adapted Automatic Mode Switchable Pattern Correction Scheme for Workpiece Inspection
Photomask Inspection Method
Pattern Inspection Apparatus and Pattern Inspection Method
Related Assignments
(5)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Sep 21, 2012
From: KABUSHIKI KAISHA TOPCON
To: NUFLARE TECHNOLOGY, INC.
Reel/Frame 029000/0022 →
Assignment of Assignor's Interest
Aug 8, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043482/0364 →
Assignment of Assignor's Interest
Apr 3, 2018
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 045421/0052 →
Assignment of Assignor's Interest
Apr 3, 2018
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 045574/0652 →
Merger and Change of Name
Aug 19, 2021
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 057224/0091 →