Patent Assignment
Reel/Frame 043482/0364
Assignment of Assignor's Interest
Recorded: 2017-08-08
Pages: 4
Assignor
KABUSHIKI KAISHA TOSHIBA
Executed: 2017-08-01
Assignee
TOSHIBA MEMORY CORPORATION
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties
(21)
Method of Operating Laser Light Source
Photomask Inspection Apparatus Comparing Optical Proximity Correction Patterns to Minimum and Maximum Limits
Sample Inspection Apparatus, Image Alignment Method, and Program-Recorded Readable Recording Medium
Workpiece Inspection Apparatus, Workpiece Inspection Method and Computer-Readable Recording Medium Storing Program
Pattern Inspection Apparatus
Pattern Inspection Apparatus and Method with Local Critical Dimension Error Detectability
Pattern Inspection Apparatus and Method with Enhanced Test Image Correctability Using Frequency Division Scheme
Pattern Inspection Apparatus
Pattern Inspection Apparatus, Corrected Image Generation Method, and Computer-Readable Recording Medium Storing Program
Level Detection Apparatus
Reticle Defect Inspection Apparatus and Reticle Defect Inspection Method
Reticle Defect Inspection Apparatus and Reticle Defect Inspection Method
Beam Irradiation Apparatus with Deep Ultraviolet Light Emission Device for Lithographic Pattern Inspection System
Mask Blank for Euv Exposure and Mask for Euv Exposure
Pattern Inspection Apparatus, Pattern Inspection Method, and Computer-Readable Recording Medium Storing a Program
Pattern Image Correcting Apparatus, Pattern Inspection Apparatus, and Pattern Image Correcting Method
Ultrafine Pattern Discrimination Using Transmitted/Reflected Workpiece Images for Use in Lithography Inspection System
Ultrafine Lithography Pattern Inspection Using Multi-Stage Tdi Image Sensors with False Image Removability
Photomask Inspection Method
Pattern Inspection Apparatus and Pattern Inspection Method
Reticle Defect Inspection Apparatus and Reticle Defect Inspection Method
Related Assignments
(13)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 9, 2008
From: YAMASHITA, KYOJI
To: ADVANCED MASK INSPECTION TECHNOLOGY, INC.
Reel/Frame 020343/0025 →
Assignment of Assignor's Interest
Feb 14, 2008
From: OGAWA, RIKI
To: ADVANCED MASK INSPECTION TECHNOLOGY, INC.
Reel/Frame 020511/0158 →
Assignment of Assignor's Interest
Mar 13, 2008
From: WATANABE, TOSHIYUKI; OGAWA, RIKI
To: ADVANCED MASK INSPECTION TECHNOLOGY, INC.
Reel/Frame 020646/0754 →
Assignment of Assignor's Interest
Jun 19, 2008
From: HIRANO, RYOICHI; OGAWA, RIKI
To: ADVANCED MASK INSPECTION TECHNOLOGY, INC.
Reel/Frame 021117/0457 →
Assignment of Assignor's Interest
Sep 15, 2008
From: HIRONO, MASATOSHI
To: ADVANCED MASK INSPECTION TECHNOLOGY, INC.
Reel/Frame 021528/0361 →
Assignment of Assignor's Interest
Jan 5, 2009
From: YAMASHITA, KYOJI
To: ADVANCED MASK INSPECTION TECHNOLOGY, INC.
Reel/Frame 022051/0923 →
Assignment of Assignor's Interest
Feb 23, 2009
From: SUGIHARA, SHINJI
To: ADVANCED MASK INSPECTION TECHNOLOGY, INC.
Reel/Frame 022294/0950 →
Assignment of Assignor's Interest
Aug 26, 2009
From: HIRONO, MASATOSHI
To: ADVANCED MASK INSPECTION TECHNOLOGY, INC.
Reel/Frame 023146/0027 →
Assignment of Assignor's Interest
Sep 20, 2010
From: ADVANCED MASK INSPECTION TECHNOLOGY INC.
To: KABUSHIKI KAISHA TOSHIBA; NEC CORPORATION
Reel/Frame 025008/0164 →
Merger and Change of Name
Aug 19, 2021
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 057224/0091 →
Change of Name
Aug 19, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 057224/0641 →
Change of Name
Jan 14, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 058737/0512 →
Merger and Change of Name
Jan 14, 2022
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 058737/0338 →