Pattern inspection apparatus and method with local critical dimension error detectability
View Patent ↗A mask/reticle pattern inspection apparatus capable of readily detecting local critical dimension (CD) errors of a circuit pattern of a testing workpiece is disclosed. This apparatus includes a search unit for finding a plurality of resembling or “look-alike” adjacent patterns around a specific pattern on the workpiece, which have similarity to the specific pattern. The inspection apparatus also includes a calculation unit for obtaining dissimilarity between the specific pattern and look-alike adjacent pattern, a variation evaluation unit which excludes an allowable error from the dissimilarity to thereby obtain a local CD error criterion value, and a CD error decision unit for determining the presence of a local CD error when the criterion value exceeds a threshold value in case the distance between the specific and look-alike patterns increases. A pattern inspection method is also disclosed.
1. An apparatus for inspecting a pattern as formed on a workpiece being tested, said apparatus comprising:
a search unit operative to find a plurality of similar neighboring patterns residing around a specific pattern on the workpiece and each having similarity to the specific pattern;
a calculation unit operative to obtain a degree of dissimilarity between the specific pattern and each said similar neighboring pattern;
a variation evaluation unit operative to exclude an allowable error from the dissimilarity to thereby obtain a local critical dimension (“CD”) error criterion value; and
a CD error decision unit operative to determine that a local CD error is present when the local CD error criterion value exceeds a threshold value in case a distance between the specific pattern and the similar neighboring pattern increases.
2. The apparatus according to claim 1 , wherein said calculation unit obtains the allowable error from the dissimilarity of the specific pattern and a similar pattern in case the local CD error is absent.
3. The apparatus according to claim 1 , wherein said search unit obtains the plurality of similar neighboring patterns with similarity to the specific pattern by use of a reference image as obtained from design data.
4. A method of inspecting a pattern as formed on a workpiece under testing, said method comprising:
obtaining a plurality of similar neighboring patterns residing around a specific pattern on the workpiece and each having similarity to the specific pattern by using a neighboring pattern searching unit of an inspection apparatus;
obtaining a degree of dissimilarity between the specific pattern and each said similar neighboring pattern by using a variation evaluation unit of the inspection apparatus;
removing an allowable error from the dissimilarity to thereby obtain a local CD error criterion value by using a dissimilarity calculation unit of the inspection apparatus; and
determining that a local CD error is present when the local CD error criterion value goes beyond a threshold value while a distance between the specific pattern and the similar neighboring pattern increases by using a local CD error decision unit of the inspection apparatus.
5. The method according to claim 4 , further comprising:
obtaining the allowable error from the dissimilarity of the specific pattern and a similar pattern in a case where the local CD error is absent by using the inspection apparatus.