Reticle defect inspection apparatus and reticle defect inspection method
View Patent ↗A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.
1. A reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light, the apparatus comprising:
a light source emitting the light;
a dose monitoring part for measuring a dose of the light to the reticle surface;
a calculating part for calculating a dose of the light accumulated on the reticle surface from the dose measured by the dose monitoring part;
a comparing part for comparing the dose of the light accumulated on the reticle surface with a preset threshold; and
a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the dose of the light accumulated on the reticle surface exceeds the threshold.
2. The apparatus according to claim 1 , further comprising a mechanism to restart irradiation of the reticle with the light when a preset relaxation time elapses after irradiation of the reticle with the light is stopped.
3. The apparatus according to claim 1 , further comprising:
an image storing part for storing the pattern image;
a storage mechanism for causing the image storing part to store the pattern image immediately before stopping irradiation of the reticle with the light; and
a display part for displaying the pattern image while irradiation of the reticle is stopped.
4. The apparatus according to claim 1 , wherein the reticle is a reflection type reticle for EUV exposure.
5. A reticle defect inspection method for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light, the method comprising:
inspecting the pattern image by irradiating the reticle surface with the light while the reticle is at rest; and
stopping irradiation of the reticle surface with the light when a dose of the light accumulated on the reticle surface exceeds a preset threshold.
6. The method according to claim 5 , further comprising restarting irradiation of the reticle with the light when a preset relaxation time elapses following a stop
after irradiation of the reticle with the light is stopped.
7. The method according to claim 6 , further comprising:
storing the pattern image immediately before stopping irradiation of the reticle with the light; and
displaying the stored pattern image
after stopping irradiation of the reticle with the light and before restarting irradiation of the reticle with the light.
8. The method according to claim 5 , wherein the reticle is a reflection type reticle for EUV exposure.
9. The apparatus according to claim 1 , wherein the dose monitoring part includes a beam splitter provided on an optical path of the laser light emitted from the light source and a dose sensor configured to receive light split by the beam splitter.
10. The apparatus according to claim 1 , wherein the dose monitoring part is located on an optical path between the light source and the reticle.