IP Library › Assignment 021117/0457
Patent Assignment
Reel/Frame 021117/0457

Assignment of Assignor's Interest

Recorded: 2008-06-19 Pages: 3
Assignors
HIRANO, RYOICHI
Executed: 2008-04-04
OGAWA, RIKI
Executed: 2008-04-04
Assignee
ADVANCED MASK INSPECTION TECHNOLOGY, INC.
8, SHINSUGITA-CHO, ISOGO-KU, YOKOHAMA-SHI, KANAGAWA, 235-0032, JAPAN
Covered Property (1)
Reticle Defect Inspection Apparatus and Reticle Defect Inspection Method
Patent: 7,894,051 →
Application: 12/061,118 →
Publication: US 2008/0259323
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 20, 2010
From: ADVANCED MASK INSPECTION TECHNOLOGY INC.
To: KABUSHIKI KAISHA TOSHIBA; NEC CORPORATION
Reel/Frame 025008/0164 →
Assignment of Assignor's Interest Aug 8, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043482/0364 →
Merger and Change of Name Aug 19, 2021
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 057224/0091 →
Change of Name Aug 19, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 057224/0641 →