IP Library › Assignment 020646/0754
Patent Assignment
Reel/Frame 020646/0754

Assignment of Assignor's Interest

Recorded: 2008-03-13 Pages: 3
Assignors
WATANABE, TOSHIYUKI
Executed: 2008-02-29
OGAWA, RIKI
Executed: 2008-02-29
Assignee
ADVANCED MASK INSPECTION TECHNOLOGY, INC.
8, SHINSUGITA-CHO, ISOGO-KU, YOKOHAMA-SHI, KANAGAWA, 235-0032, JAPAN
Covered Property (1)
Reticle Defect Inspection Apparatus and Reticle Defect Inspection Method
Patent: 7,911,599 →
Application: 12/047,554 →
Publication: US 2008/0239290
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 20, 2010
From: ADVANCED MASK INSPECTION TECHNOLOGY INC.
To: KABUSHIKI KAISHA TOSHIBA; NEC CORPORATION
Reel/Frame 025008/0164 →
Assignment of Assignor's Interest Aug 8, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043482/0364 →
Merger and Change of Name Jan 14, 2022
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 058737/0338 →
Change of Name Jan 14, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 058737/0512 →