IP Library Assignment 021528/0361
Patent Assignment
Reel/Frame 021528/0361

Assignment of Assignor's Interest

Recorded: 2008-09-15 Pages: 3
Assignor
HIRONO, MASATOSHI
Executed: 2008-07-29
Assignee
ADVANCED MASK INSPECTION TECHNOLOGY, INC.
8, SHINSUGITA-CHO, ISOGO-KU, YOKOHAMA-SHI, KANAGAWA, 235-0032, JAPAN
Covered Property (1)
Mask Blank for Euv Exposure and Mask for Euv Exposure
Patent: 7,935,460 →
Application: 12/209,380 →
Publication: US 2009/0075184
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 20, 2010
From: ADVANCED MASK INSPECTION TECHNOLOGY INC.
To: KABUSHIKI KAISHA TOSHIBA; NEC CORPORATION
Reel/Frame 025008/0164 →
Assignment of Assignor's Interest Aug 8, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043482/0364 →
Merger and Change of Name Aug 19, 2021
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 057224/0091 →
Change of Name Aug 19, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 057224/0641 →