Image density-adapted automatic mode switchable pattern correction scheme for workpiece inspection
View Patent ↗An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model parameters from the pattern image of interest and determine the value of a total sum of these identified parameters. This value is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed.
1. A method for correcting a pattern image by use of an inspection reference pattern image of a workpiece being tested and a pattern image under test, comprising:
dividing each of the reference pattern image and the under-test pattern image into a plurality of regions;
generating by linear predictive modeling a set of simultaneous equations for the reference pattern image thus divided and the divided test pattern image divided;
solving the equations to obtain model parameters for the plurality of regions; obtaining a model parameter sum for each said region;
applying interpolation processing to the reference pattern image and the test pattern image in units of sub-pixels to thereby generate a sub-pixel interpolated image;
using the sub-pixel interpolated image to obtain a sub-pixel shift amount for minimization of a deviation error in position between the reference pattern image and the test pattern image;
comparing each model parameter sum to a threshold to find an error therebetween, if any;
when every model parameter sum is within the threshold, combining together corrected pattern images as generated by the linear predictive modeling to thereby generate a single corrected pattern image;
when at least one model parameter sum is out of the threshold, redoing said dividing by use of a reduced number of division of the reference pattern image and the test pattern image; and
when said dividing is failed and the model parameter sum is out of the threshold, generating an interpolated corrected image based on interpolation processing.
2. A method for correcting a pattern image by use of an inspection reference pattern image of a workpiece being tested and a pattern image under test, comprising:
dividing each of the reference pattern image and the under-test pattern image into a plurality of regions;
generating by linear predictive modeling a set of simultaneous equations for the reference pattern image thus divided and the divided test pattern image divided;
solving the equations to obtain model parameters for the plurality of regions;
obtaining a model parameter sum with respect to each of said plurality of regions;
applying interpolation processing to the reference pattern image and the test pattern image in units of sub-pixels to thereby generate a sub-pixel interpolated image;
using the sub-pixel interpolated image to obtain a sub-pixel shift amount for minimization of a deviation error in position between the reference pattern image and the test pattern image;
comparing each model parameter sum to a threshold to find an error therebetween, if any;
when at least one model parameter sum is out of the threshold, generating an interpolated corrected image based on interpolation processing; and
performing image synthesis by cutting a region with its model parameter sum being out of the threshold and then pasting an interpolated corrected image corresponding such region to thereby generate a corrected pattern image.
3. A method for correcting a pattern image by use of an inspection reference pattern image of a workpiece being tested and a pattern image under test, comprising:
dividing each of the reference pattern image and the under-test pattern image into a plurality of regions;
generating by linear predictive modeling a set of simultaneous equations for the reference pattern image thus divided and the divided test pattern image divided;
solving the equations to obtain model parameters for the plurality of regions;
obtaining model parameter sums with respect to said plurality of regions;
applying interpolation processing to the reference pattern image and the test pattern image in units of sub-pixels to thereby generate a sub-pixel interpolated image;
using the sub-pixel interpolated image to obtain a sub-pixel shift amount for minimization of a deviation error in position between the reference pattern image and the test pattern image;
comparing each model parameter sum to a threshold to find an error therebetween, if any; and
when at least one model parameter sum is out of the threshold, performing image synthesis by cutting a corrected pattern image region thereof and then pasting in the cut region a corrected pattern image with a finally obtained difference being within the threshold to thereby generate a corrected pattern image.