Image density-adapted automatic mode switchable pattern correction scheme for workpiece inspection
View Patent ↗An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model parameters from the pattern image of interest and determine the value of a total sum of these identified parameters. This value is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed.
1. A device for correcting a pattern image by use of an inspection reference pattern image of a workpiece being tested and a pattern image under test, said device comprising:
an equation generation unit operative to generate by linear predictive modeling a set of simultaneous equations for the reference pattern image and the under-test pattern image;
a parameter generation unit operative to solve the equations to thereby obtain model parameters;
a parameter sum calculation unit operative to obtain a total sum of model parameters;
a sub-pixel interpolation computing unit operative to perform interpolation against the reference pattern image and the test pattern image to thereby generate a sub-pixel interpolated image;
a sub-pixel shift amount generation unit operative to use the sub-pixel interpolated image to obtain a sub-pixel shift amount for minimization of a deviation error in position between the reference pattern image and the test pattern image;
an error comparison unit operative to compare the parameter sum and a threshold;
a corrected pattern image generation unit operative to use the model parameter to generate a corrected pattern image based on the linear predictive modeling; and
an interpolated image correction unit operative to generate an interpolated corrected image based on interpolation processing.
2. The device according to claim 1 , further comprising:
an image division unit for dividing each of the reference pattern image and the test pattern image into a plurality of regions.
3. The device according to claim 1 , further comprising:
an image division unit for dividing each of the reference pattern image and the test pattern image into a plurality of regions; and
a replacement correction unit for replacing part of the interpolated corrected image at a position corresponding to a divided corrected pattern image with the corrected pattern image.
4. The device according to claim 1 , further comprising:
a monitor unit for storing and monitoring a record history of at least one of the parameter sum and the sub-pixel shift amount.
5. An apparatus for performing pattern inspection by using an inspection reference pattern image of a workpiece being tested and a pattern image under testing, said apparatus comprising:
an equation generation unit operative to generate by linear predictive modeling a set of simultaneous equations for the reference pattern image and the under-test pattern image;
a parameter generation unit operative to solve the equations to thereby obtain model parameters;
a parameter sum calculation unit operative to obtain a total sum of model parameters;
a sub-pixel interpolation computing unit operative to perform interpolation against the reference pattern image and the test pattern image to thereby generate a sub-pixel interpolated image;
a sub-pixel shift amount generation unit operative to use the sub-pixel interpolated image to obtain a sub-pixel shift amount for minimization of a deviation error in position between the reference pattern image and the test pattern image;
an error comparison unit operative to compare the parameter sum and a threshold;
a corrected pattern image generation unit operative to use the model parameter to generate a corrected pattern image based on the linear predictive modeling;
an interpolated image correction unit operative to generate an interpolated corrected image based on interpolation processing; and
a pattern image comparison unit operative to compare the test pattern image to any one of the corrected pattern image and the interpolated corrected image.
6. A method for correcting a pattern image by use of an inspection reference pattern image of a workpiece being tested and a pattern image under test, said method comprising:
generating by linear predictive modeling a set of simultaneous equations for the reference pattern image and the under-test pattern image;
solving the equations to thereby obtain model parameters;
obtaining a total sum of model parameters;
performing interpolation against the reference pattern image and the test pattern image to thereby generate a sub-pixel interpolated image;
using the sub-pixel interpolated image to obtain a sub-pixel shift amount for minimization of a deviation error in position between the reference pattern image and the test pattern image;
comparing the parameter sum and a threshold to find an error therebetween, if any;
when the parameter sum is within the threshold, using the model parameter to generate a corrected pattern image based on the linear predictive modeling; and
when the parameter sum is out of the threshold, generating an interpolated corrected image based on interpolation processing.
7. The method according to claim 6 , further comprising:
storing and monitoring a record history of at least one of the model parameter sum and the sub-pixel shift amount.
8. A method for correcting a pattern image by use of an inspection reference pattern image of a workpiece being tested and a pattern image under test, comprising:
dividing each of the reference pattern image and the under-test pattern image into a plurality of regions;
generating by linear predictive modeling a set of simultaneous equations for the reference pattern image thus divided and the divided test pattern image divided;
solving the equations to obtain model parameters for the plurality of regions;
obtaining a total sum of the model parameters with respect to each of said plurality of regions;
applying interpolation processing to the reference pattern image and the test pattern image in units of sub-pixels to thereby generate a sub-pixel interpolated image;
using the sub-pixel interpolated image to obtain a sub-pixel shift amount for minimization of a deviation error in position between the reference pattern image and the test pattern image;
comparing each model parameter sum to a threshold to determine whether an error is found therebetween;
when every model parameter sum is within the threshold, combining together corrected pattern images as generated by the linear predictive modeling to thereby generate a single corrected pattern image; and
when at least one model parameter sum is out of the threshold, generating an interpolated corrected image based on interpolation processing.
9. A method for performing pattern inspection by using an inspection reference pattern image of a workpiece being tested and a pattern image under testing, comprising:
generating by linear predictive modeling a set of simultaneous equations for the reference pattern image and the under-test pattern image;
solving the equations to thereby obtain model parameters;
obtaining a model parameter sum;
performing interpolation against the reference pattern image and the test pattern image to thereby generate a sub-pixel interpolated image;
using the sub-pixel interpolated image to obtain a sub-pixel shift amount for minimization of a deviation error in position between the reference pattern image and the test pattern image;
comparing the model parameter sum to a threshold to find an error therebetween, if any;
when the model parameter sum is within the threshold, using the model parameter to generate a corrected pattern image based on the linear predictive modeling;
when the model parameter sum is out of the threshold, generating an interpolated corrected image based on interpolation processing; and
comparing the test pattern image to any one of the corrected pattern image and the interpolated corrected image.