IP Library › Assignment 021399/0275
Patent Assignment
Reel/Frame 021399/0275

Assignment of Assignor's Interest

Recorded: 2008-08-18 Pages: 4
Assignor
VON KAENEL, HANS
Executed: 2008-07-24
Assignee
EPISPEED S.A.
TECHNOPARKSTRASSE 1, CH-8005 ZURICH, SWITZERLAND
Covered Property (1)
System and Process for High-Density, Low-Energy Plasma Enhanced Vapor Phase Epitaxy
Patent: 8,647,434 →
Application: 11/817,208 →
Publication: US 2008/0152903
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Nov 15, 2010
From: EPISPEED SA
To: SULZER METCO AG
Reel/Frame 025306/0043 →