IP Library › Assignment 025306/0043
Patent Assignment
Reel/Frame 025306/0043

Assignment of Assignor's Interest

Recorded: 2010-11-15 Pages: 3
Assignor
EPISPEED SA
Executed: 2010-06-22
Assignee
SULZER METCO AG
RIGACKERSTRASSE 16, CH-5610 WOHLEN, SWITZERLAND
Covered Property (1)
System and Process for High-Density, Low-Energy Plasma Enhanced Vapor Phase Epitaxy
Patent: 8,647,434 →
Application: 11/817,208 →
Publication: US 2008/0152903
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 18, 2008
From: VON KAENEL, HANS
To: EPISPEED S.A.
Reel/Frame 021399/0275 →