IP Library › Assignment 021569/0719
Patent Assignment
Reel/Frame 021569/0719

Assignment of Assignor's Interest

Recorded: 2008-09-23 Pages: 3
Assignors
OGAWA, TAKASHI
Executed: 2008-08-01
MUTO, HIROTO
Executed: 2008-08-04
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property (1)
Charged-Particle Beam Apparatus
Patent: 7,804,066 →
Application: 12/177,563 →
Publication: US 2009/0008572
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
Change of Address Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
Change of Name Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →