Patent Assignment
Reel/Frame 021938/0962
Assignment of Assignor's Interest
Recorded: 2008-12-08
Pages: 4
Assignor
ASML US, INC.
Executed: 2003-09-09
Assignee
ASML HOLDING N.V.
DE RUN 1110, NL-5503 LA VELDHOVEN, NETHERLANDS
Covered Properties
(2)
Plasma Deposition of Spin Chucks to Reduce Contamination of Silicon Wafers
Patent:
6,242,364 →
Application:
09/275,360 →
Plasma Deposition of Spin Chucks to Reduce Contamination of Silicon Wafers
Related Assignments
(8)
Other recorded transfers of the patents in this record — the chain of ownership.
Change of Name
Oct 3, 2003
From: ASML USA, INC.
To: ASML HOLDING N.V.
Reel/Frame 014821/0456 →
Assignment of Assignor's Interest
Oct 3, 2003
From: ASML USA, INC.
To: ASML HOLDING N.V.
Reel/Frame 014821/0131 →
Change of Name
Nov 24, 2003
From: ASML USA, INC.
To: ASML HOLDING N.V.
Reel/Frame 014815/0933 →
Assignment of Assignor's Interest
Jul 6, 2004
From: ASML USA, INC.
To: ASML HOLDING N.V.
Reel/Frame 014815/0851 →
Change of Name
Aug 8, 2008
From: ASML US, INC.
To: ASML US, LLC
Reel/Frame 021360/0088 →
Merger
Aug 8, 2008
From: SVG LITHOGRAPHY SYSTEMS, INC.
To: ASML US, INC.
Reel/Frame 021360/0189 →
Change of Name
Aug 8, 2008
From: SILICON VALLEY GROUP, INC.
To: ASML US, INC.
Reel/Frame 021360/0168 →
Merger
Aug 8, 2008
From: ASML US, LLC
To: ASML US, INC.
Reel/Frame 021360/0092 →