IP Library Assignment 021971/0366
Patent Assignment
Reel/Frame 021971/0366

Assignment of Assignor's Interest

Recorded: 2008-12-12 Pages: 5
Assignor
ASML US, INC.
Executed: 2003-09-15
Assignee
ASML HOLDING N.V.
DE RUN 1110, NL-5503 LA VELDHOVEN, NETHERLANDS
Covered Properties (2)
Photoresist Coating Process Control with Solvent Vapor Sensor
Patent: 6,027,760 →
Application: 08/987,179 →
Method and Apparatus for Resolving Conflicts in a Substrate Processing System
Patent: 6,418,356 →
Application: 09/336,353 →
Publication: US 2002/0059015
Related Assignments (4)
Other recorded transfers of the patents in this record — the chain of ownership.
Change of Name & Merger Dec 11, 2003
From: SILICON VALLEY GROUP, INC.
To: ASML US, INC.
Reel/Frame 014863/0715 →
Change of Name Aug 8, 2008
From: ASML US, INC.
To: ASML US, LLC
Reel/Frame 021360/0088 →
Merger Aug 8, 2008
From: ASML US, LLC
To: ASML US, INC.
Reel/Frame 021360/0092 →
Merger Aug 8, 2008
From: SVG LITHOGRAPHY SYSTEMS, INC.
To: ASML US, INC.
Reel/Frame 021360/0189 →