IP Library › Assignment 022105/0744
Patent Assignment
Reel/Frame 022105/0744

Assignment of Assignor's Interest

Recorded: 2008-12-31 Pages: 2
Assignors
SHICHI, HIROYASU
Executed: 2008-12-01
MATSUBARA, SHINICHI
Executed: 2008-12-01
OHSHIMA, TAKASHI
Executed: 2008-12-01
TOMIMATSU, SATOSHI
Executed: 2008-12-09
HASHIZUME, TOMIHIRO
Executed: 2008-12-03
ISHITANI, TOHRU
Executed: 2008-12-09
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Gas Field Ion Source, Charged Particle Microscope, and Apparatus
Patent: 8,115,184 →
Application: 12/318,583 →
Publication: US 2009/0173888
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →