IP Library Assignment 022121/0406
Patent Assignment
Reel/Frame 022121/0406

Assignment of Assignor's Interest

Recorded: 2009-01-16 Pages: 3
Assignor
SHINOTSUKA, KEI
Executed: 2008-12-17
Assignee
OJI PAPER CO., LTD.
7-5, GINZA 4-CHOME, CHUO-KU, TOKYO, JAPAN
Covered Property (1)
Single Particle Film Etching Mask and Production Method of Single Particle Film Etching Mask, Production Method of Micro Structure with Use of Single Particle Film Etching Mask and Micro Structure Produced by Micro Structure Production Method
Patent: 8,202,582 →
Application: 12/306,476 →
Publication: US 2009/0274873